eucerin Ultra Sensitive Repair Mask

Ingredients overview

Label order. Colour is our internal rating: green routine, yellow restricted or worth a look, red prohibited or high-risk, grey not yet decoded.

Ingredients are listed in label order; the order reflects the label only, not exact concentrations.

1. Aqua
2. Butylene Glycol
3. Glycerin
4. Dipropylene Glycol
5. Panthenol
6. 4-T-Butylcyclohexanol
7. Hyaluronic Acid
8. Hydrolyzed Hyaluronic Acid
9. Arginine
10. Allantoin
11. 1,2-Hexanediol
12. Propanediol
13. Polysorbate 20
14. Polysorbate 60
15. Sodium Hyaluronate
16. Hydroxyacetophenone
17. Pentylene Glycol
18. Carbomer
19. Ethylhexylglycerin
20. Hydroxyethylcellulose
21. Sodium Phosphate
22. Centella Asiatica Extract
23. Centella Asiatica Leaf Extract
24. Centella Asiatica Root Extract
25. Pinus Pinaster Bark Extract
26. Asiatic Acid
27. Asiaticoside
28. Madecassic Acid
29. Madecassoside
30. Disodium Phosphate
31. Disodium EDTA

Highlights

Free of alcoholFree of parabensFree of siliconesFree of sulfatesFree of mineral oilFree of essential oilsFree of formaldehyde releasersContains fragranceContains PEG

Key ingredients

SOLVENT

Aqua

HUMECTANT

Butylene Glycol

DENATURANT

Glycerin

FRAGRANCE

Dipropylene Glycol4-T-Butylcyclohexanol

ANTISTATIC

PanthenolHyaluronic Acid

HAIR CONDITIONING

Hydrolyzed Hyaluronic Acid

Other ingredients

ArginineAllantoin1,2-HexanediolPropanediolPolysorbate 20Polysorbate 60Sodium HyaluronateHydroxyacetophenonePentylene GlycolCarbomerEthylhexylglycerinHydroxyethylcelluloseSodium PhosphateCentella Asiatica ExtractCentella Asiatica Leaf ExtractCentella Asiatica Root ExtractPinus Pinaster Bark ExtractAsiatic AcidAsiaticosideMadecassic AcidMadecassosideDisodium PhosphateDisodium EDTA

Skim through

Ingredients explained

Aqua

Solvent, main base; microbial control is critical

Butylene Glycol

Polyol humectant and solvent at 1–5%; aids solubilization, light feel

Glycerin

Workhorse humectant at 3–10%; tacky at high levels, pair with occlusives

Dipropylene Glycol

Solvent for essential oils; better humectancy than PEG

Panthenol

Panthenol (vitamin B5) at 1–5%; moisturizing and reparative, supports barrier recovery

4-T-Butylcyclohexanol

Fixative and scent masker; not a primary skin conditioning agent.

Hyaluronic Acid

High-water-binding humectant at 0.1-1%; high-MW for surface film, low-MW for dermal potential, check cationic compatibility.

Hydrolyzed Hyaluronic Acid

Low-MW humectant with superior penetration vs high-MW; 0.1-0.5% typical, hygroscopic, store dry to prevent clumping.

Arginine

Arginine for moisturizing/conditioning; amino acid, high biocompatibility, often used in blends.

Allantoin

Skin soother at 0.5-2%; promotes cell regeneration

1,2-Hexanediol

Polyol solvent and preservative booster at 1–5%; light feel, can replace some traditional preservatives

Propanediol

Polyol solvent at 1–5%; light feel, aids solubilization, propylene glycol alternative

Polysorbate 20

Non-ionic emulsifier and cleansing surfactant; contains PEG, control microbial load.

Polysorbate 60

Non-ionic emulsifier and solubilizer for O/W or W/O stability; may cause mild stinging on sensitive skin, typically 1-5%.

Sodium Hyaluronate

Potent humectant at 0.1–2%; different MW for penetration depth, high levels may draw moisture

Hydroxyacetophenone

Hydroxyacetophenone as antioxidant; often boosts Vitamin C, works in acidic pH.

Pentylene Glycol

Polyol humectant at 1-3%; low irritancy, suitable for sensitive skin

Carbomer

Gelling thickener requiring neutralization; watch out for ion compatibility

Ethylhexylglycerin

Mild conditioner and preservative booster at 0.5–1%; reduces preservative load, smooth feel

Hydroxyethylcellulose

Water-soluble cellulose ether for thickening and suspension stabilization; sensitive to ions, electrolytes reduce viscosity, use at pH 7-8.

Sodium Phosphate

Phosphate buffer and anti-seborrheic; pH regulator, aids sebum control, high levels are irritating

Centella Asiatica Extract

Centella asiatica extract for soothing/repair; low irritation, common in sensitive skin products.

Centella Asiatica Leaf Extract

Centella asiatica extract for repair and soothing; contains asiaticoside, good for barrier

Centella Asiatica Root Extract

Soothing and repairing extract; classic anti-inflammatory, good for sensitive skin

Pinus Pinaster Bark Extract

Bark extract used as an antioxidant; ensure consistent raw material sourcing.

Asiatic Acid

Pro-healing active, 0.1–1%; stability affected by light, store protected from light.

Asiaticoside

Plant glycoside, healing and antioxidant; poor solubility, use low levels with solubilizers.

Madecassic Acid

Madecassoside hydrolysis product for barrier repair and anti-inflammatory action; mild, low typical usage

Madecassoside

Triterpenoid glycoside with soothing, repairing, and antioxidant effects; typical concentration 0.1-1%, suitable for sensitive or compromised skin, good stability.

Disodium Phosphate

Phosphate buffer for pH adjustment and preservation; water-soluble; high levels may irritate mucous membranes.

Disodium EDTA

Chelating agent at 0.05–0.5%; sequesters metal ions for stability, boosts preservative efficacy

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