clinicare EGF Pure Mask

Ingredients overview

Label order. Colour is our internal rating: green routine, yellow restricted or worth a look, red prohibited or high-risk, grey not yet decoded.

Ingredients are listed in label order; the order reflects the label only, not exact concentrations.

1. Aqua
2. Glycerin
3. Butylene Glycol
4. Beta-Glucan
5. Hyaluronic Acid
6. Portulaca Oleracea Extract
7. Niacinamide
8. SH-Oligopeptide-1
9. Panax Ginseng Root Extract
10. Aloe Barbadensis Leaf Juice
11. Camellia Sinensis Leaf Extract
12. Dna
13. Collagen
14. Xanthan Gum
15. DMDM Hydantoin
16. Panthenol
17. Centella Asiatica Extract
18. Chamomilla Recutita Flower Extract
19. Glycyrrhiza Glabra Root Extract
20. Polygonum Cuspidatum Root Extract
21. Rosmarinus Officinalis Leaf Extract
22. Scutellaria Baicalensis Root Extract
23. Magnolia Kobus Bark Extract
24. Citrus Paradisi Fruit Extract
25. Thujopsis Dolabrata Extract
26. Disodium EDTA
27. Imidazolidinyl Urea
28. Allantoin
29. Tocopheryl Acetate
30. Polysorbate 80
31. Chlorphenesin
32. Phenoxyethanol
33. 1.2-Hexanediol
34. Parfum

Highlights

Free of alcoholFree of siliconesFree of sulfatesFree of mineral oilContains fragranceContains animal-derivedContains formaldehyde releasersContains essential oilsContains EU-26 allergensContains parabensContains PEG

Key ingredients

SOLVENT

Aqua

DENATURANT

Glycerin

HUMECTANT

Butylene Glycol

BULKING

Beta-Glucan

ANTISTATIC

Hyaluronic Acid

SKIN CONDITIONING

Portulaca Oleracea ExtractSH-Oligopeptide-1

SMOOTHING

Niacinamide

Other ingredients

Panax Ginseng Root ExtractAloe Barbadensis Leaf JuiceCamellia Sinensis Leaf ExtractDnaCollagenXanthan GumDMDM HydantoinPanthenolCentella Asiatica ExtractChamomilla Recutita Flower ExtractGlycyrrhiza Glabra Root ExtractPolygonum Cuspidatum Root ExtractRosmarinus Officinalis Leaf ExtractScutellaria Baicalensis Root ExtractMagnolia Kobus Bark ExtractCitrus Paradisi Fruit ExtractThujopsis Dolabrata ExtractDisodium EDTAImidazolidinyl UreaAllantoinTocopheryl AcetatePolysorbate 80ChlorphenesinPhenoxyethanol1.2-HexanediolParfum

Skim through

Ingredients explained

Aqua

Solvent, main base; microbial control is critical

Glycerin

Workhorse humectant at 3–10%; tacky at high levels, pair with occlusives

Butylene Glycol

Polyol humectant and solvent at 1–5%; aids solubilization, light feel

Beta-Glucan

Polysaccharide for soothing and hydration; high MW acts on the surface, poor penetration into deep dermis.

Hyaluronic Acid

High-water-binding humectant at 0.1-1%; high-MW for surface film, low-MW for dermal potential, check cationic compatibility.

Portulaca Oleracea Extract

Achyronica extract with anti-inflammatory properties; monitor for heavy metals and pesticides, low-risk at typical doses

Niacinamide

Niacinamide at 2–5%; improves texture, controls oil, brightens; high levels may cause sensitivity

SH-Oligopeptide-1

Synthetic short oligopeptide for skin conditioning; generally low irritancy and comedogenicity

Panax Ginseng Root Extract

Botanical extract for skin and hair conditioning; activity and irritation risk vary by source/purity, patch test for sensitive skin

Aloe Barbadensis Leaf Juice

Natural humectant and soother with high water activity; requires preservative system, generally well-tolerated

Camellia Sinensis Leaf Extract

Green tea extract for antioxidant/astringent; contains caffeine, possible irritation in sensitive skin.

Dna

DNA for skin conditioning and humectancy; high molecular weight polymer, usually from fermentation or extraction, external use as humectant

Collagen

Hydrating conditioning agent; soluble protein used in hair care and toners; forms occlusive layer.

Xanthan Gum

Natural thickener at 0.1–1%; provides gel texture, pH-stable, requires full hydration

DMDM Hydantoin

Formaldehyde-releasing preservative (V/33 limit); monitor cumulative formaldehyde with fragrances.

Panthenol

Panthenol (vitamin B5) at 1–5%; moisturizing and reparative, supports barrier recovery

Centella Asiatica Extract

Centella asiatica extract for soothing/repair; low irritation, common in sensitive skin products.

Chamomilla Recutita Flower Extract

Plant extract, soothing properties; contains natural allergens, high levels may irritate.

Glycyrrhiza Glabra Root Extract

Liquorice root extract for soothing and brightening; batch variability, watch polyphenol interactions

Polygonum Cuspidatum Root Extract

Polygonum cuspidatum root extract, source of resveratrol antioxidant; water or alcohol soluble, check color shift with iron ions

Rosmarinus Officinalis Leaf Extract

Plant extract containing rosmarinic acid etc., with antioxidant and antimicrobial properties; may contain allergenic fragrances, patch test for sensitive skin, typical concentration <1%.

Scutellaria Baicalensis Root Extract

Scutellaria root extract with baicalin for antioxidant and soothing effects; also provides astringent and humectant properties.

Magnolia Kobus Bark Extract

Not decoded yet

Citrus Paradisi Fruit Extract

Grapefruit extract; antioxidant, contains furanocoumarins (photosensitizing), use low concentration, avoid sun.

Thujopsis Dolabrata Extract

Not decoded yet

Disodium EDTA

Chelating agent at 0.05–0.5%; sequesters metal ions for stability, boosts preservative efficacy

Imidazolidinyl Urea

Formaldehyde releaser in preservative systems; monitor for formaldehyde and urea sensitivity issues.

Allantoin

Skin soother at 0.5-2%; promotes cell regeneration

Tocopheryl Acetate

Vitamin E derivative antioxidant at 0.1–1%; more stable than tocopherol, store protected from light

Polysorbate 80

Non-ionic emulsifier and solubilizer; watch for interaction with parabens

Chlorphenesin

Phenolic antimicrobial; strict EU limits apply, potential allergen, careful dosing required for leave-on products.

Phenoxyethanol

Broad-spectrum preservative at ≤1%; may irritate sensitive eye areas, often paired with ethylhexylglycerin

1.2-Hexanediol

Humectant and preservative booster; gentle at low levels, potential sensitizer at high

Parfum

Fragrance for scent; may contain allergens, caution for sensitive skin, full labeling required.

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